The only tool of its kind in Ireland, the ORION Nanofab is equipped with gallium, neon, and helium beams, combining high-resolution imaging with the fast, efficient milling capabilities of a FIB, for high-precision and high-throughput. Seamlessly switch between Ga - for removal of massive material, Ne - for high speed, high throughput nanofabrication, and He - for delicate, sub-10nm nanofabrication, and high-resolution imaging. The tool is also well suited to imaging challenging sample sets such as polymer based systems and biological specimens, due to the absence of charging effects traditionally associated with SEM.
Equipped with gallium, neon, and helium beams.
Capable of 0.5 nm resolution.
He- and Ne-ion lithography capabilities.